Fellowship

ARL-West: Topological Materials and Interfacial Coupling for Electronic Device Application

DEVCOM Army Research Laboratory Original Source
Award

Not specified

Deadline

No deadline

Location

United States

Applicants

individual

About This Opportunity

The U.S. Army Research Laboratory (ARL) seeks a highly motivated postdoctoral fellow with experience in the synthesis and fabrication of high quality topological, magnetic materials and heterostructures, and in electrical and magnetic characterization techniques. This postdoctoral fellow will investigate controls for physical processes that underlie theoretical descriptions of concept topological electronic devices (TEDs) for efficient electronics, sensors, and/or radio frequency (RF) technologies and demonstrate them. The fellow will be stationed in the laboratory of Dr. Kang Wang at UCLA and collaborate with other ARL researchers pursuing similar goals. ARL is accelerating a strategic initiative to move the physics of topological materials to the engineering of emerging electronic devices that may solve future battlefield challenges with ultra-efficient electronics and RF technology. Many of these opportunities can take advantage of topological surface currents and spin-orbit coupling at room temperature even with today's imperfect materials. This fellowship offers a unique opportunity to take full advantage of ARL's strategic intra-extramural reach with seamless collaboration among ARL laboratories, extended campuses and leading academic scientists. Success will be defined by demonstrating underlying phenomena above cryogenic temperatures revealing that theoretically proposed concepts are viable.

Who Can Apply

Region
United States
Citizenship
United States
Project in
United States
Applicants
individual
Age
18 - 151 years old

Application Details

Stages

  1. 1 two_stage

Required documents

cv transcripts references research_proposal

Review process

Applicants must first be selected by an advisor, then submit a research proposal to the ARL-RAP review panel for final approval.

Additional benefits

  • mentorship
  • networking